General Information
Electron Microscopy
Focused Ion Beam
Atomic Force Microscopy
Ion Scattering
Applications
Reservations
Instrument Rates
FEI Strata DB235 Focused Ion Beam
Specifications
Resolution
SEI 30 kV, 18 mm WD
7 nm
SEI 30 kV, 7 mm WD
3 nm
SEI 1 kV, 2 mm WD
3 nm
Gun
Schottky field emission gun
Probe Current
up to 20 nA
Accelerating voltage
0.2 - 30 kV
Imaging
Magnification range
55 - 700,000 x
Modes
SEI,BEI, IBI
Specimen Stage
Movement
x: 25 mm
y: 25 mm
z: 25 mm
Tilt: 0 - 52
o
Rotation: 360
o
Maximum specimen size
Diam: 80 mm
Height: 25 mm
Gas Injection Systems:
Pt deposition
Enhanced metals etch
Delineation (selective oxide) etch
Selective carbon etch
PENN Regional Nanotechnology Facility
University of Pennsylvania / 3231 Walnut Street / Philadelphia PA 19104 /
prnf@seas.upenn.edu
/ 215.898.8718