Electron-Beam Lithography Software
High-resolution and high-throughput e-beam lithography is severely impacted by process effects, electron scattering effects, and tool artifacts resulting in non- ideal pattern transfer. Although the e- beam tool is a highly sophisticated and expensive printer, the pattern data needs to be optimized to significantly reduce the effects of various error sources such as beam positioning between shapes, filling shapes with "shots" on a discrete grid, field position dependent aberrations, stitching between fields, the spread of energy by electron scattering (proximity) and process effects.
BEAMER is a comprehensive software platform for preparing data ideally for exposure:
See the link to GenISys web site.