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For operating instructions go to the nanofab wiki (PennKey required for login).
The 80+ is a parallel-plate reactive ion etcher (RIE). The tool has a fluorine-based chemistry: CHF3, CF4, SF6, O2, and Ar.
- substrate type and size
- film stack
- etch depth/profile desired
The following materials are typically etched: silicon, silicon oxide, and silicon nitride.
A 600 Watt RF generator with automatic matching network is close-coupled to the lower
The temperature of the lower electrode is controlled by a Thermo RTE7 Digital Plus
The tool uses an Alcatel ATP 400 l/s turbo pump for high vacuum generation.