80+ RIE

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The 80+ is a parallel-plate reactive ion etcher (RIE). The tool has a fluorine-based chemistry: CHF3, CF4, SF6, O2, and Ar.

The following materials are typically etched: silicon, silicon oxide, and silicon nitride.

A 600 Watt RF generator with automatic matching network is close-coupled to the lower electrode.

The temperature of the lower electrode is controlled by a Thermo RTE7 Digital Plus chiller.

The tool uses an Alcatel ATP 400 l/s turbo pump for high vacuum generation.