Karl Suss MA4
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Please make training requests only when your need is imminent.
Be sure to include the following information with your request:
For operating instructions go to the nanofab wiki (PennKey required for login).
- substrate type and size
- photo mask dimensions (incl. thickness)
- photoresist to be exposed (incl. thickness)
The MA4 is a mask aligner that can accommodate up to 4-inch wafers. The minimum lithographic feature size is 2-3
The following exposure modes can be employed:
The tool is equipped with an infrared backside alignment system.
- Soft contact
- Hard contact