Karl Suss MA4
Tool managers:
- ED Goodwin (earlgood[at]sas[dot]upenn[dot]edu)
- Pavan Nukala (pnukala[at]seas[dot]upenn[dot]edu)
- Nicholas Schneider (schnic[at]seas[dot]upenn[dot]edu)
- Eric Johnston (ericdj[at]seas[dot]upenn[dot]edu)
- Lauren Willis (willisl[at]sas[dot]upenn[dot]edu)
- Kim Venta (kimventa[at]sas[dot]upenn[dot]edu)
For operating instructions go to the nanofab wiki (PennKey required for login).
The MA4 is a mask aligner that can accommodate up to 4-inch wafers. The minimum lithographic feature size is 2-3
μm.
The following exposure modes can be employed:
- Proximity
- Soft contact
- Hard contact
The tool is equipped with an infrared backside alignment system.