Nanonex NX-2600BA
Tool managers:
[Nanoimprinter]
- Wenxiang Chen (wenxiang[at]seas[dot]upenn[dot]edu)
[Mask Aligner]
- Hiromichi Yamamoto (hyam[at]seas[dot]upenn[dot]edu)
For operating instructions go to the nanofab wiki (PennKey required for login).
The NX-2600BA is a nanoimprinter (left side) and a mask aligner (right side).
Nanoimprinter
- Thermal imprint (up to 300
ºC)
- UV imprint
- Up to 500 psi pressure
- Sample size: small pieces to 6" wafers
Mask aligner
- 500 W Hg discharge lamp (350-450 nm); see wiki for power density (mW/cm2)
- 5" square mask holder
- 2" and 4" substrate holders
- Camera-based front side alignment
- Camera-based back side alignment
- The minimum lithographic feature size is 2-3
μm.