Tool managers:

• Hiro Yamamoto (hyam[at]seas[dot]upenn[dot]edu)
• Kyle Keenan (kckeenan[at]seas[dot]upenn[dot]edu)

For operating instructions go to the nanofab wiki (PennKey required for login).

The stepper can achieve the following:

1. Minimum feature of 700 nm
2. 50 nm overlay
3. 28 dies (15 mm square) can be placed on a 4” wafer

To use this specific stepper, the following requirements need to be met:

1. 4-inch wafers ONLY
2. Wafer thickness of 500 um
3. 5-inch reticle ONLY
4. The resist must be sensitive to the g-line (436 nm)