SU-8 2000 is a high contrast, epoxy based photoresist designed for micromachining and other microelectronic applications, where a thick, chemically and thermally stable image is desired. SU-8 2000 is an improved formulation of SU-8, which has been widely used by MEMS producers for many years. The use of a faster drying, more polar solvent system results in improved coating quality and increases process throughput. SU-8 2000 is available in twelve standard viscosities.
Note: Some bubbles remain in the SU-8 film if high viscous SU-8, such as 2050, is spin-coat on the substrate without care. Make sure that the SU-8 solution is completely covered on the substrate without any bubbles before spin-coat.